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Resource Name
Oxford: PlasmaPro 100 ICPCVD Plasma Technolgy
RRID:SCR_020375 RRID Copied      
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Oxford: PlasmaPro 100 ICPCVD Plasma Technolgy (RRID:SCR_020375)
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Resource Information

URL: https://plasma.oxinst.com/products/icpcvd/plasmapro-100-icpcvd

Proper Citation: Oxford: PlasmaPro 100 ICPCVD Plasma Technolgy (RRID:SCR_020375)

Description: ICPCVD process module is designed to produce films at low growth temperatures, enabled through high density remote plasmas that achieves film quality with low substrate damage.

Resource Type: instrument resource

Keywords: Oxford, Plasma Technology, Instrument, Resource equipment, Equipment, USEDit,

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