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URL: https://plasma.oxinst.com/products/icp-etching/plasmapro-100-icp
Proper Citation: Oxford: PlasmaPro 100 Cobra Plasma Technolgy (RRID:SCR_020371)
Description: PlasmaPro 100 Cobra ICP utilises high density plasma to achieve etching and deposition rates. Process modules offer uniformity, high throughput, high precision and low damage processes for wafer sizes up to 200mm.
Resource Type: instrument resource
Keywords: Oxford, Plasma Technology, Instrument, Resource equipment, Equipment, USEDit,
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