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Proper Citation: JEOL: JBX-9500FS Electron Beam Lithography System (RRID:SCR_020171)
Description: Electron beam lithography system that is versatile in its applications from basic research of elements to test production of optical elements to research and development for masks for high accelerating voltage exposure.
Resource Type: instrument resource
Keywords: Jeol, JEOL, Electron Beam Lithography System, Instrument Equipment, USEDit,
Availability: Commercially available
Resource Name: JEOL: JBX-9500FS Electron Beam Lithography System
Resource ID: SCR_020171
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Source: SciCrunch Registry (RRID:SCR_005400)
Description: Interactive portal for finding and submitting biomedical resources. Resources within SciCrunch have assigned RRIDs which are used to cite resources in scientific manuscripts. SciCrunch Registry, formerly NIF Registry, provides resources catalog. Allows to add new resources. Allows edit existing resources after registration. Curators are tasked with identifying and registering resources, examining data, writing configuration files to index and display data and keeping contents current.
URL: https://rrid.site/rin/sources/SCR_005400
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