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Proper Citation: JEOL: JBX-8100FS Electron Beam Lithography System (RRID:SCR_020170)
Description: Electron beam lithography system that writes ultrafine patterns at faster rate of speed while minimizing idle time, especially during exposure process, thus increasing throughput.
Resource Type: instrument resource
Keywords: Jeol, JEOL, Electron Beam Lithography System, Instrument Equipment, USEDit,
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