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Resource Name
UConn Nanofabrication Facility
RRID:SCR_012346 RRID Copied      
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UConn Nanofabrication Facility (RRID:SCR_012346)
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Resource Information

URL: http://www.scienceexchange.com/facilities/nanofabrication-facility

Proper Citation: UConn Nanofabrication Facility (RRID:SCR_012346)

Description: THIS RESOURCE IS NO LONGER IN SERVICE. Documented on May 16, 20224. Nanofabrication Facility houses three instruments for patterning of flat surfaces and selective etching of materials. Researchers fabricate devices and structures to demonstrate novel device concepts and to characterize new materials. To carry out these functions this new facility consists of three instruments: a Tescan Electron-Beam Lithography Tool, an OAI high resolution Mask Aligner and Advanced Vacuum/Plasma Therm Reactive Ion Etcher.

Abbreviations: UConn Nanofabrication Facility

Synonyms: UConn Biotechnology - Bioservices Center Nanofabrication Facility, University of Connecticut Biotechnology - Bioservices Center Nanofabrication Facility

Resource Type: core facility, service resource, access service resource

Keywords: electron beam lithography, optical lithography, reactive ion etching

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University of Connecticut; Connecticut; USA

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