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URL: https://plasma.oxinst.com/products/ion-beam/ionfab
Proper Citation: Oxford: Ionfab Ion Beam Plasma Technology (RRID:SCR_020358)
Description: Ion beam etch and deposition system is used for high quality material processing. Systems have flexible hardware options including open load, single substrate load lock, and cassette to cassette.
Resource Type: instrument resource
Keywords: Oxford, Plasma Technology, Instrument, Resource equipment, Equipment, USEDit,
Availability: Commercially available
Resource Name: Oxford: Ionfab Ion Beam Plasma Technology
Resource ID: SCR_020358
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Source: SciCrunch Registry (RRID:SCR_005400)
Description: Interactive portal for finding and submitting biomedical resources. Resources within SciCrunch have assigned RRIDs which are used to cite resources in scientific manuscripts. SciCrunch Registry, formerly NIF Registry, provides resources catalog. Allows to add new resources. Allows edit existing resources after registration. Curators are tasked with identifying and registering resources, examining data, writing configuration files to index and display data and keeping contents current.
URL: https://rrid.site/rin/sources/SCR_005400
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